Event Detail
Title: Tutorial #6 - How Design Meets Yield in the Fab
Type: Friday Tutorial
Track: DFM and the Manufacturing Interface
Day:
Friday
Time: 9:00 AM - 5:00 PM
Room: 6D
Organizers: P. Groeneveld - Magma, A. Kahng - UC San Diego
Speakers: A. Oberai - Magma, P. Chatterjee - SiliconMap, LLC, B. Wong - Chartered, R. Madge - LSI, C. Progler - Photronics Inc., B. Benware - Mentor
Abstract: This tutorial will present the state-of-the-art approaches to yield learning, yield diagnosis, and yield improvement techniques that perform optimization of the chip before it reaches the fab. These techniques are increasingly critical to reaching timely volume production of high-value IC products such as GPUs and baseband processors. The five presenters will address yield from different angles, providing a uniquely broad perspective. This makes the tutorial of interest to designers, EDA professionals, product managers and researchers who have interest in the concepts of yield, yield learning, and design optimization for yield. The first part of the tutorial lays down the ways that yield is actually treated inside the fab. This includes on-die yield measurement, diagnosis and how such volume statistical data is used to improve wafer production in 'cycles of process learning'. The second set of presenters specifically addresses ways of using this knowledge to improve the design flow upstream. This includes not only a mask perspective, but also higher-level layout- and circuit-design techniques that will result in a better yielding IC production.
